Analysis software capable of analyzing gas flow under low pressure conditions, such as vacuum exhaust simulation, and compatible with rarefied gases (rarefied fluids).
**Features**
- Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices.
- High parallel efficiency enables quick computation results even for large-scale shapes.
- Utilizes a particle method, ensuring convergence solutions even with poor-quality computational grids, unlike fluid models.
- Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably achieve results.
**Supports Various Cases**
- Simulation of rarefied gas flow in a vacuum chamber.
- Simulation of thin film generation in semiconductor manufacturing.
- Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE).
- Film deposition simulations involving chemical reactions like CVD.
**Outputs Various Calculation Results**
- Calculation of chemical reactions.
- Calculation of chemical reactions from Arrhenius-type reaction data.
- Calculation of dissociation, recombination, and molecular (atomic) exchange reactions.
- Ability to set multiple reaction equations on the GUI.
*For more details, please refer to the catalog or feel free to contact us.*
![[Example] Exhaust simulation of DSMC-Neutrals vacuum device](https://image.www.ipros.com/public/product/image/361/2001485617/IPROS48949169048140987774.png?w=280&h=280)
![[Case Study] Analysis of Dust Behavior in 'DSMC-Neutrals'](https://image.www.ipros.com/public/product/image/edc/2000943133/IPROS09323625418177019101.png?w=280&h=280)
![[Case Study] "DSMC-Neutrals" Vacuum Exhaust Simulation](https://image.www.ipros.com/public/product/image/680/2000943137/IPROS91926670943097480082.png?w=280&h=280)
![[Case Study] CVD Analysis of Showerhead-Type DSMC-Neutrals](https://image.www.ipros.com/public/product/image/940/2000943142/IPROS14582509350813000707.png?w=280&h=280)
